Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
نویسندگان
چکیده
منابع مشابه
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ژورنال
عنوان ژورنال: ACS Applied Materials & Interfaces
سال: 2017
ISSN: 1944-8244,1944-8252
DOI: 10.1021/acsami.7b05571